Handbook of Thin Film Process Technology
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advanced materials processing
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Author_David A Glocker
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Flat Panel Displays
Glocker David A
Grant O Este
H-O Blom
High Substrate Bias
Jochen M Schneider
Language_English
Magnetron Sputtering
magnetron technology
Matching Network
Metal Deposition Rate
multilayer coatings
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Pulse DC
Pulse DC Power
reactive
Reactive Gas
Reactive Gas Flow
Reactive Gas Molecules
Reactive Gas Partial Pressure
Reactive Magnetron Sputtering
Reactive Sputtering
Reactive Sputtering Process
RF Discharge
RF Reactive Sputtering
RF Sputtering
RF Supply
S Berg
S Ismat Shah
Secondary Electron Emission Coefficient
softlaunch
Sputter Source
sputtering
surface engineering
T Nyberg
Thin Compound Layer
thin film diagnostics
Thin Film Process Technology
unbalanced magnetron sputtering techniques
vacuum deposition
William D Sproul
William D Westwood
Product details
- ISBN 9781315893686
- Weight: 330g
- Dimensions: 210 x 297mm
- Publication Date: 29 Nov 2017
- Publisher: Taylor & Francis Ltd
- Publication City/Country: GB
- Product Form: Hardback
- Language: English
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The Handbook of Thin Film Process Technology is a practical handbook for the thin film scientist, engineer and technician. This handbook is regularly updated with new material, and this volume is a special issue on reactive sputtering which will be of interest to a wide range of industrial and academic researchers in addition to owners of the main Handbook. Some recent developments in the reactive sputtering field are covered, including unbalanced magnetron sputtering and pulsed reactive sputtering. The articles contain a wealth of practical information relating to applications, practice and manufacturing techniques.
