A01=J Reece Roth
Abnormal Glow Discharge
active
Author_J Reece Roth
Carbon Tetrafluoride
Category=PH
DBD Reactor
density
discharge
electron
Electron Kinetic Temperature
Electron Neutral Collision Frequency
Electron Number Density
eq_bestseller
eq_isMigrated=1
eq_isMigrated=2
eq_nobargain
eq_non-fiction
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Etching Rate
glow
Glow Discharge
Glow Discharge Plasma
industrial plasma engineering
Intermediate Pressure Regime
Ion Beam Implantation
Ion Energy Distribution Function
Microelectronic Circuit Fabrication
Microelectronic Etching
Negative Glow Plasma
Neutral Gas Pressure
nonthermal plasma processing
number
partially ionized Lorentzian plasmas
Plasma Active Species
Plasma Ion Implantation
Plasma Processing Applications
Plasma Sources
plasmas
reactor
RF Glow Discharge
RF Parallel Plate
Sheath Thickness
species
Sputter Deposition
workpiece
Xenon Difluoride
Product details
- ISBN 9780367455149
- Weight: 453g
- Dimensions: 156 x 234mm
- Publication Date: 07 Jan 2019
- Publisher: Taylor & Francis Ltd
- Publication City/Country: GB
- Product Form: Paperback
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Written by a leading expert in the field, Industrial Plasma Engineering, Volume 2: Applications to Nonthermal Plasma Processing provides a background in the principles and applications of low temperature, partially ionized Lorentzian plasmas that are used industrially. The book also presents a description of plasma-related processes and devices that are of commercial interest. The text is suitable for students or in-service users with a physics and calculus background at the sophomore level. These two volumes are intended to be used as textbooks at the senior or first-year graduate level by students from all engineering and physical science disciplines and as a reference source by in-service engineers.
J Reece Roth Department of Electrical and Computer Engineering University of Tennessee, Knoxville
