Semiconductor Quantum Well Intermixing
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advanced quantum well processing
AlGaAs Quantum Wells
band structure engineering
Bandgap Shift
Category=PHV
DFB Laser
dielectric capping techniques
Electroabsorption Modulators
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GaAs QW
Group Iii
III-V semiconductors
impurity diffusion mechanisms
InP Quantum
InP QW
Interdiffusion Coefficient
Interdiffusion Effects
Layer Intermixing
MQW Sample
MQW Structure
optical device fabrication
photonic integration
Point Defects
QCSE
Quantum Dot
Quantum Wells
QW Structure
QW's Laser
QW's Material
QW’s Laser
QW’s Material
Refractive Index Profile
RTA Temperature
RTA Treatment
SiN Film
TM Mode
Product details
- ISBN 9780367447472
- Weight: 453g
- Dimensions: 156 x 234mm
- Publication Date: 07 Jan 2020
- Publisher: Taylor & Francis Ltd
- Publication City/Country: GB
- Product Form: Paperback
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Semiconductor Quantum Well Intermixing is an international collection of research results dealing with several aspects of the diffused quantum well (DFQW), ranging from Physics to materials and device applications. The material covered is the basic interdiffusion mechanisms of both cation and anion groups as well as the properties of band structure modifiations. Its comprehensive coverage of growth and pos-growth processing technologies along with its presentation of the various interesting and advanced features of the DFQW materials make this book an essential reference to the study of QW layer intermixing.
Lie\, J. T.
