Spacer Engineered FinFET Architectures: High-Performance Digital Circuit Applications
English
By (author): Brajesh Kumar Kaushik Pankaj Kumar Pal Sudeb Dasgupta
This book focusses on the spacer engineering aspects of novel MOS-based devicecircuit co-design in sub-20nm technology node, its process complexity, variability, and reliability issues. It comprehensively explores the FinFET/tri-gate architectures with their circuit/SRAM suitability and tolerance to random statistical variations.
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